The research center has a 180 sqm ISO 6 (class 1000) clean room with chemical and laminar (ISO 2) flow hoods, outfitted with the following nanofabrication / characterization equipment:

• EOL JBX-6300FS High Resolution Electron Beam Lithography, 100KeV, 12MHz, 8nm resolution for Master & Mask Production (the only high resolution e-beam lithography system available in Italy at a research center).
• Nova 600 NanoLab Dual Beam SEM / FIB Focused Ion Beam, 30KeV for Nanoscale Prototyping, Machining and characterization and analysis of structures below 100nm
• DYMAX PC, 400W Light Curing System
• Sputter coater, spin coaters, hot plates, magnetic stirrers, ultrasonic baths, dryers, oven

LaNN also has an optics laboratory equipped with the following characterization tools:

• J.A. Woollam VASE Ellipsometer 270-2400nm, for analysis in Reflection and Transmission
• ZEISS AXIO Scope.A1 Optical Microscopy, equipped with 5x, 20x, 50x, 100x, 150x lenses and a digital camera for Laboratory Imaging
• A10 APE research AFM Microscopy
• Alpha SNOM WITEC SNOM Microscopy for fluorescence and micro-Raman analysis in confocal geometry
• Melles Griot (35mW power) He-Ne Laser, Melles Griot Wavelength-Tunable Ar Ion Laser (up to 40mW power)
• Optical bench and accessories

LaNN has several techniques for micro-nano lithography, illustrated below:

• Electron Beam Lithography (EBL)
• Focused Ion Beam Lithography (FIB)
• Soft Lithography

LaNN also has various characterization techniques for optical, spectroscopic, topographic, morphological and compositional analysis:

• Spectroscopic Ellipsometry
• SEM Microscopy
• AFM Microscopy
• SNOM Microscopy, Fluorescence and Micro-Raman Spectroscopy