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Contents

Technology units

Technology units

Nanofabrication

Nanofabrication TU is devoted to the development of multiple processes in relation to the various projects that LaNN is involved in.
Thanks to the availability of state-of-the-art instrumentation, such as an electron-beam lithography system EBL JEOL JBX-6300FS (100KeV) with proximity correction and an ionic and electronic lithography system FIB / SEM Nova 600 NanoLab DualBeam (30 KeV), LaNN is able to generate high-resolution (to 6 nm) nanostructures with uttermost precision.
3D lithography techniques for optoelectronic and holographic applications have been developed, together with multi-layered nanostructures lithography techniques, thanks to the high precision allowed by overlay processes.
In addition, master fabrication processes for imprinting and roll-to-roll imprinting have been developed, together with low-cost and high-throughput replica processes of micro-nanostructured masters through soft lithography manufacturing.

Characterization


The laboratory is outfitted to carry out nanometric characterizations and molecular analyses by fluorescence and micro-Raman spectroscopy. It is equipped with an AFM microscope for topographic measurements, a SNOM microscope for close-range spectroscopy measurements and a high-resolution SEM / FIB focused ion beam (1.1 nm @ 15 kV) for topographic, morphological, compositional and IC and PIC failure analysis.
There is also a spectroscopic elliptometer for reflection and transmission analysis. The optical laboratory is equipped with a 35mW power He-Ne laser and with an Argon ion-tunable laser with powers up to 40mW.

ECAMRICERT SRL
Viale del Lavoro, 6
36030 Monte di Malo
Vicenza, Italy
T +39 0445 605838
F +39 0445 581430
info@ecamricert.com
C.F./P.I. 01650050246